| 摘要 |
PROBLEM TO BE SOLVED: To provide a method by which carbon nanotubes can directly be prepared on a substrate, the average values of the diameter and length of the carbon nanotubes can be controlled and the carbon nanotubes can selectively prepared on the substrate or only in an optional site on the substrate and perpendicularly oriented relatively to the substrate. SOLUTION: A carbon feed gas such as methane, ethylene or acetylene and hydrogen gas are used as introduction gases and carbon nanotubes are oriented in the perpendicular direction relatively to the substrate surface and prepared on the substrate surface of Ni, Fe, Co or an alloy composed of at least two kinds of the metals thereof by a plasma chemical vapor deposition(CVD) method. A glass or an Si wafer having an optional pattern comprising a metal and formed thereon is used as the substrate to carry out the CVD method and the carbon nanotubes are selectively prepared only in the patterned part.
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