发明名称 |
Method for forming EPROM and flash memory cells with source-side injection |
摘要 |
A method for forming an electrically-programmable read-only-memory (EPROM) or a flash memory cell is disclosed. The EPROM or flash memory cell provides both source-side and drain-side injection, along with a reduced cell size, by forming the memory cell in a trench. The drain is formed in the top surface of the substrate, the source is formed in the bottom surface of the trench, and the stacked gate is formed over the sidewall of the trench.
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申请公布号 |
US6190968(B1) |
申请公布日期 |
2001.02.20 |
申请号 |
US19980185893 |
申请日期 |
1998.11.04 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
KALNITSKY ALEXANDER;BERGEMONT ALBERT;PICHLER CHRISTOPH |
分类号 |
H01L21/8247;H01L29/423;H01L29/788;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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