| 发明名称 |
System and method for providing a lithographic light source for a semiconductor manufacturing process |
| 摘要 |
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
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| 申请公布号 |
US6190835(B1) |
申请公布日期 |
2001.02.20 |
| 申请号 |
US19990306224 |
申请日期 |
1999.05.06 |
| 申请人 |
ADVANCED ENERGY SYSTEMS, INC. |
发明人 |
HAAS EDWIN G.;GUTOWSKI ROBERT M;CALIA VINCENT S. |
| 分类号 |
G03F7/20;H01L21/027;H05G2/00;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/20 |
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