发明名称 RESIN FOR PHOTOFORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a resin which is used for photoformation methods and enables the formation of three-dimensional formed products having high surface accuracy by simple means. SOLUTION: This resin for photoformation methods contains an X-ray curable component which can sensitively be cured by the irradiation of X-rays having a stronger substance-penetrating force than that of UV light. Since the resin composition can be photocured using the X-rays, operation labors can be reduced, when a three-dimensional formed product having a large width in the depth direction is formed. Since the joined portions of cured resin layers can further be decreased, the unevenness of the surfaces of the formed product can be reduced.
申请公布号 JP2001048932(A) 申请公布日期 2001.02.20
申请号 JP19990225683 申请日期 1999.08.09
申请人 SENTAN KAGAKU GIJUTSU INCUBATION CENTER:KK 发明人 MURAKAMI TAMOTSU
分类号 B29C67/00;C08F2/54;C08F20/10;C08F299/00;C08L101/00;C08L101/16;(IPC1-7):C08F20/10 主分类号 B29C67/00
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