发明名称 SEMICONDUCTOR WAFER TREATER AND TREATMENT OF THE SEMICONDUCTOR WAFER
摘要 <p>PROBLEM TO BE SOLVED: To separate a semiconductor wafer electrostatically attracted on a wafer mounting table in a vacuum vessel from the mounting table, without causing positional deviation of the wafer from the mounting table due to the flipping wafer. SOLUTION: A semiconductor wafer mounting table 2 is kept ascended beforehand, until the position where the upper surface of the table 2 is positioned higher than the upper electrode cover 4, for separating a semiconductor wafer 1 electrostatically attracted on the table 2 in a vacuum vessel 7 from the table 2, and wafer lift pins 3 are thrusted up at the positions of the pins 3 to separate the wafer 1 from the table 2, whereby even though a flipping wafer 1 is generated, the peripheral deviation of the wafer 1 from the table 2 is not generated as the wafer 1 is positioned on the inner wall of the cover 4. Hereby, the wafer 1 can be made readily to separate from the table 2, without generating nonconformities in carrying the wafer.</p>
申请公布号 JP2001044265(A) 申请公布日期 2001.02.16
申请号 JP19990210755 申请日期 1999.07.26
申请人 NEC CORP 发明人 YOSHIDA HIDEO
分类号 H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
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