发明名称 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To substantially improve data retention characteristics of a second cell (a reference cell, a redundancy memory cell, an OTP region, etc.), comprising substantially the same steps and same structure as those of a first cell (memory cell), without increasing the number of steps needlessly. SOLUTION: By utilizing the property that a threshold returns to initial value, namely an initial threshold by the fact that a second cell is damaged by baking, the initial threshold of the second cell is shifted to approach a setting threshold demanded for the second cell as closely as possible. Specifically, when threshold control ions are implanted in a channel region, impurities having concentration different from a memory cell or impurities having different conductivity types are ion implanted.
申请公布号 JP2001044392(A) 申请公布日期 2001.02.16
申请号 JP19990217932 申请日期 1999.07.30
申请人 FUJITSU LTD 发明人 TAKAHASHI SATOSHI
分类号 H01L21/8247;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 主分类号 H01L21/8247
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