| 摘要 |
PROBLEM TO BE SOLVED: To reduce the occurrence of development defects by incorporating a resin containing one of specified groups each containing an alicyclic hydrocarbon structure and increasing its alkali solubility under the action of an acid and a fluorine- and/or silicon-containing surfactant. SOLUTION: This positive type photoresist composition contains a compound which generates an acid when irradiated with active light or radiation, a resin containing at least one of groups of formulae I and II each containing an alicyclic hydrocarbon structure and increasing its alkali solubility under the action of the acid and a fluorine- and/or silicon-containing surfactant. In the formulae I and II, R1 is methyl, ethyl or the like, ZA is an atomic group required to form an alicyclic hydrocarbon group together with C, R2 and R3 are each 1-4C linear or branched alkyl and ZB is a di- or trivalent alicyclic hydrocarbon group. |
