发明名称 PRODUCTION OF LIGHT-REFLECTING SUBSTRATE AND REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To form a surface having smooth recesses and projections without melting resin at a high temperature in the process of roughening a photosensitive resin applied on a substrate by exposure and development to form recesses and projections for diffusion of light. SOLUTION: In the production of a light-reflecting substrate 20 to be used for a reflection type liquid crystal display device using an inner diffusion and reflection method, a positive photosensitive polyimide resin 27 is applied in a film state on a glass substrate 21 having a smooth surface, then the resin film is partially exposed through a photomask, developed and baked at a specified temperature. Thus, recesses 27a are formed in the positive photosensitive polyimide resin to roughen the surface. Then a light-reflecting layer consisting of a metal film is formed all over the roughened surface.
申请公布号 JP2001042319(A) 申请公布日期 2001.02.16
申请号 JP19990216857 申请日期 1999.07.30
申请人 OPTREX CORP 发明人 IGUCHI SHINSUKE;YOSHII TOYO
分类号 G03F7/039;G02B5/02;G02F1/1335;G03F7/40 主分类号 G03F7/039
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