发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION AND POSITIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition capable of forming an image superior in contrast between an image part and a nonimage and wide in development latitude and sufficient in film endurance, and more preferably, nonsensitive to ultraviolet rays and superior in handleability even under white fluorescent light and to provide the positive lithographic printing plate. SOLUTION: The positive photosensitive composition comprises a photothermoconverting material capable of absorbing light from an image exprosure light source and converting it into heat and a novolak resin and it contains no pyrolyzate obtained by decomposed the photothermoconverting material by action of the heat caused by absorbing the light of the exposure light source, and the novolak resin made from phenols comprising >=60 mol% o-cresol, and the positive lithographic printing plate is provided with a layer made from this photosensitive composition on the surface of a support.
申请公布号 JP2001042519(A) 申请公布日期 2001.02.16
申请号 JP20000149258 申请日期 2000.05.22
申请人 MITSUBISHI CHEMICALS CORP 发明人 SASAKI MITSURU
分类号 G03F7/023;B41N1/14;C08K5/00;C08L61/10;G03F7/00;G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/023
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