发明名称 EXPOSURE DEVICE AND EXPOURE METHOD
摘要 PROBLEM TO BE SOLVED: To form a fine latent image, to expose a master disk in which a recording density is improved by modulating an exposing laser beam whose wavelength by an SHG is the specified value or less with a modulation means and irradiating the master disk by a near-field effect using an objective lens whose numerical aperture is the specified value or more. SOLUTION: In a laser beam source 43, an exposing laser beam L2 having the prescribed wavelength is generated and emitted with a BBO crystal 51 being a nonlinear optical element in an external oscillator 48 from the laser beam of wavelength 532 nm emitted by making incident a YAG laser beam on an SHG crystal incorporated in an SHG light source 44. The exposing laser beam L2 of wavelength 300 nm or less by the SNG is modulated by an acoustooptical element 61 being a modulation means and a master disk is irradiated with the exposing laser beam L2 by a near-field effect using an objective lens 80 whose numerical aterture is 1.0 or more via the optical system held by a moving optical table 29.
申请公布号 JP2001043575(A) 申请公布日期 2001.02.16
申请号 JP19990214562 申请日期 1999.07.29
申请人 SONY CORP 发明人 TAKEDA MINORU;FURUKI MOTOHIRO;IMANISHI SHINGO
分类号 G03B27/72;G03F7/20;G11B7/09;G11B7/12;G11B7/125;G11B7/135;G11B7/26;(IPC1-7):G11B7/26 主分类号 G03B27/72
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