| 摘要 |
<p>A method and apparatus are provided for providing characterization data for semiconductor devices. A first data set containing measured results obtained from wafer electrical tests performed on the semiconductor device during the fabrication process is compared (S216) to a second data set containing values corresponding to design characteristics for the semiconductor device. Based on this comparison, semiconductor devices having valid and invalid performance characteristics are identified. The characterization results data are subsequently (S220) generated for the identified semiconductor devices.</p> |
