发明名称 ALIGNMENT MARK AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To form a colored layer pattern with good accuracy of position while utilizing materials used in step for forming colored layers when the colored layers are formed on the thin film transistor side of an active matrix substrate, to produce an alignment mark capable of enhancing open area ratio and yield and to produce an active matrix substrate using the alignment mark. SOLUTION: This alignment mark 23b is formed in the formation of a source- drain electrode constituting TFT and a red filter 13a' is thickly disposed on the alignment mark 23b. Each colored layers formed later is made thin on the red filter 13a' and the alignment mark 23b is accurately detected through exposure alignment laser in an exposure step.
申请公布号 JP2001042547(A) 申请公布日期 2001.02.16
申请号 JP19990215894 申请日期 1999.07.29
申请人 NEC CORP 发明人 NAKADA SHINICHI;YAMAMOTO YUJI;OKAMOTO MAMORU;SAKAMOTO MICHIAKI;YOSHIKAWA SHUKEN;MARUYAMA MUNEO
分类号 H01L21/027;G02F1/1335;G02F1/136;G02F1/1362;G02F1/1368;G03F9/00;H01L21/336;H01L23/544;H01L29/786 主分类号 H01L21/027
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