发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive resin composition which does not impair its performances such as sensitivity and focal depth even when a minute design rule such as super-resolution technique is applied. SOLUTION: The positive type radiation sensitive resin composition contains (A) a resin obtained by protecting at least a part of the phenolic hydroxyl groups of an alkali-soluble polymer with acid decomposable protective groups and (B) a radiation sensitive compound which generates an acid under the action of radiation. The molar extinction coefficient of the resin A at 248 nm wavelength is 500-2,000 and that of the radiation sensitive compound B at 248 nm wavelength is 10,000-30,000.
申请公布号 JP2001042530(A) 申请公布日期 2001.02.16
申请号 JP19990196937 申请日期 1999.07.12
申请人 SHIPLEY CO LLC 发明人 KAMEYAMA YASUHIRO;KON ZEN
分类号 H01L21/027;C08F2/46;C08L25/18;G03F7/039 主分类号 H01L21/027
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