METHOD FOR DETERMINING OVERLAP OF PATTERN

摘要

PURPOSE: A method for determining overlap of a pattern is to display a misalignment data when a detected alignment error value of a die is not within an allowable range of an alignment error. CONSTITUTION: A method for determining overlap of an upper photoresist pattern and a lower pattern comprises the steps of: setting an allowable value of alignment error on each die of a wafer; calculating an alignment error value after determining overlap on each die of the wafer; comparing the alignment error value with the allowable value of alignment error; displaying a misalignment data when the alignment error value of a die is not within the allowable range of the alignment error; and determining whether subsequent process is again progressed or not. The misalignment data comprises a coordinate of the die, an allowable value of an alignment error, and an alignment error value.