发明名称 APPARATUS FOR OPENING AND CLOSING GAS HOLE OF REACTION CHAMBER IN ASHING PROCESS FOR MANUFACTURING SEMICONDUCTOR ELEMENT
摘要 PURPOSE: An apparatus for opening and closing a gas hole of a reaction chamber is to alternatively control a degree of opening the gas hole, therefor obtaining the uniformity of the process in an ashing process of a semiconductor element. CONSTITUTION: An apparatus for opening and closing a gas hole of a reaction chamber comprises a gas hole shutter(2) for opening and closing the gas hole(100); an operating member for operating the gas hole shutter; a signal line(4) connected to operate simultaneously the operating member; and an ON/OFF switch(5) connected to the signal line for controlling the operating member. The gas hole is separated from the center of a gas hole panel with a predetermined distance and to form a symmetrical shape. The gas hole shutter is hinged about the periphery of the gas hole panel so as to open/close the gas hole. The operating member for operating the gas hole shutter comprises a motor connected to a hinged shaft(200) of the gas hole shutter.
申请公布号 KR20010010590(A) 申请公布日期 2001.02.15
申请号 KR19990029575 申请日期 1999.07.21
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 SHIN, JAE CHEON
分类号 H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/306
代理机构 代理人
主权项
地址