发明名称 |
APPARATUS FOR OPENING AND CLOSING GAS HOLE OF REACTION CHAMBER IN ASHING PROCESS FOR MANUFACTURING SEMICONDUCTOR ELEMENT |
摘要 |
PURPOSE: An apparatus for opening and closing a gas hole of a reaction chamber is to alternatively control a degree of opening the gas hole, therefor obtaining the uniformity of the process in an ashing process of a semiconductor element. CONSTITUTION: An apparatus for opening and closing a gas hole of a reaction chamber comprises a gas hole shutter(2) for opening and closing the gas hole(100); an operating member for operating the gas hole shutter; a signal line(4) connected to operate simultaneously the operating member; and an ON/OFF switch(5) connected to the signal line for controlling the operating member. The gas hole is separated from the center of a gas hole panel with a predetermined distance and to form a symmetrical shape. The gas hole shutter is hinged about the periphery of the gas hole panel so as to open/close the gas hole. The operating member for operating the gas hole shutter comprises a motor connected to a hinged shaft(200) of the gas hole shutter.
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申请公布号 |
KR20010010590(A) |
申请公布日期 |
2001.02.15 |
申请号 |
KR19990029575 |
申请日期 |
1999.07.21 |
申请人 |
HYUNDAI MICRO ELECTRONICS CO., LTD. |
发明人 |
SHIN, JAE CHEON |
分类号 |
H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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