发明名称 DUST COVER/PELLICLE FOR A PHOTOMASK
摘要 The invention relates to superconductor articles, and compositions and methods for making superconductor articles. The methods can include using a precursor solution having a relatively small concentration of total free acid. The articles can include more than one layer of superconductor material in which at least one layer of superconductor material can be formed by a solution process, such as a solution process involving the use of metalorganic precursors.
申请公布号 WO0111428(A1) 申请公布日期 2001.02.15
申请号 WO2000US19215 申请日期 2000.07.14
申请人 AMERICAN SUPERCONDUCTOR CORPORATION 发明人 FRITZEMEIER, LESLIE, G.;ZHANG, WEI;PALM, WALTER, C.;RUPICH, MARTIN, W.;CRAVEN, CHRISTOPHER
分类号 B22F7/00;B22F7/02;B23K35/36;C30B5/00;C30B23/02;H01B12/06;H01B13/00;H01L39/14;H01L39/24 主分类号 B22F7/00
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