| 摘要 |
<p>An electron beam physical vapor deposition (EBPVD) apparatus (10) that includes loading, preheat and coating chambers (16, 18, 14, 12) which must operate at elevated temperatures and subatmospheric pressures. The apparatus (10) further includes a movable platform system (24) that facilitates the relative positioning of the loading and preheat chambers (16, 18, 14) of the apparatus (10). The platform system (24) supports at least one loading chamber (16, 18), and is movable relative to the preheat chamber (14) so as to bring the loading chamber (16, 18) into and out of alignment with the preheat chamber (14). The platform system (24) has an extremely low elevational profile, preferably not more than 2.5 cm, so as to essentially eliminate any risk to the operators of the EBPVD apparatus (10) during repositioning of the loading chamber (16, 18).</p> |
