| 发明名称 |
COMPOSITION AND METHOD FOR REMOVING PROBING INK AND NEGATIVE PHOTORESIST FROM SILICON WAFERS |
| 摘要 |
A composition and method for removing probing ink and negative photoresist from a substrate with reduced metal corrosion, low toxicity and rapid removal rates. The composition includes a mixture of anisole, an alkylarylsulfonic acid, and aliphatic hydrocarbons containing 9 to 13 carbon atoms.
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| 申请公布号 |
WO0033140(A8) |
申请公布日期 |
2001.02.15 |
| 申请号 |
WO1999US28058 |
申请日期 |
1999.11.23 |
| 申请人 |
SILICON VALLEY CHEMLABS, INC.;SAHBARI, JAVAD, J. |
发明人 |
SAHBARI, JAVAD, J. |
| 分类号 |
G03F7/42;H01L21/027;H01L21/308;(IPC1-7):G03F7/42 |
主分类号 |
G03F7/42 |
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