METHOD FOR SUPPRESSING GENERATION OF REACTIVITY BY-PRODUCT

摘要

PURPOSE: A method for suppressing generation of a reactive by-product is to miniature a generation of a particle and a reactivity by-product by correcting a conventional process condition so that an optimum etching is achieved. CONSTITUTION: A method for preventing a reactivity by-product being generated comprises the steps of: depositing an oxide film on a wafer completed with a cleaning; loading the wafer into a chamber in which a film etching process performed; executing an etching process in accordance with a process condition used in the film etching process; analyzing a component and amount of a contaminant remaining on the oxide film after the etching process is completed; and correcting the process condition by evaluating a contamination rate of a metal by using the analyzed resultant and examining a correlation between the contaminant and the metal to be etched. The oxide film is deposited at a thickness of 3000 angstroms. The component and amount of the contaminant is analyzed by using a TXRF(Total Reflection X-Ray Fluorescence).