INDUCTIVE COUPLED PLASMA REACTOR

摘要

PURPOSE: An inductive coupled plasma reactor is to prevent the damage of an antenna pin during the plasma process, therefor preventing the generation of a particle due to etching Ar gas. CONSTITUTION: An inductive coupled plasma reactor comprises a reaction chamber(200); a chuck(208) disposed in the reaction chamber and comprising a surface for accepting and supporting a semiconductor wafer(206); and a sealing member for preventing an entry of Ar gas during the plasma process. The chuck comprises the first portion contacted with the semiconductor wafer; the second portion disposed in a lower portion of the first portion and comprising a plurality of holes in its side surface; an antenna pin(214) inserted into the hole of the second portion for measuring a direct current bias of the first portion. Since an antenna pin cap is inserted into a gap between the antenna pin and the hole, the entry of the gas is further prevented during the process.