| 摘要 |
The invented mixture for treating substrates containing silicon, particularly glass or ceramics contains a component A, formed by at least one polysiloxane containing Si-H bonds, a component B, formed by at least one bifunctional, trifunctional or tetrafunctional silane containing an alkoxy group or the group CHi3COO- and a component C, formed by at least one strong anhydrous organic or inorganic acid.
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