发明名称 A continuous emissions monitor of multiple metal species in harsh environments
摘要 A continuous emissions monitor for the measurement of vapor phase and particulate-based metals in gas streams such as those at coal-fired utility plants, incinerators and manufacturing facilities, in which a pulsed plasma source (10), utilizing a resonant reentrant microwave cavity (12) which is powered by a microwave generator (34), operates at sub atmospheric pressures (<50 Torr.) by using a pump (48) in order to eliminate quenching of the light emission processes by other species in the gas stream and reduce the background emission and where the pulsed operation of the source reduces background light emission from oxides of nitrogen produced in plasma sources operating with nitrogen and oxygen gases thus enhancing the contrast and signal-to-background; resulting in the instrument having a minimum detection level of 0.01 micrograms/m-3 for mercury, as well as, other metal elements such as arsenic and selenium, and requiring less than 10 Watts of microwave power.
申请公布号 AU6116400(A) 申请公布日期 2001.02.13
申请号 AU20000061164 申请日期 2000.07.21
申请人 PHILIP C. EFTHIMION 发明人 PHILIP C. EFTHIMION
分类号 G01N1/14;G01N1/22;G01N1/24;G01N1/40;G01N1/44;G01N21/68;G01N21/71;G01N21/73;G01N21/74 主分类号 G01N1/14
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