| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device capable of forming a high hardness and fine amorphous carbon film and also capable of executing efficient film formation. SOLUTION: A chamber 1 for film formation is provided with clamp electrodes 19a and 19b, and a carbon fiber 23 is extended on the space between the clamp electrodes 19a and 19b. By directly flowing large pulse current through the carbon fiber 23, it is expansively flowen (i.e., instantaneously vaporized). In this way, the carbon fiber 23 is instantaneously changed into plasma gas subjected to abrasion, and carbon grains contained in the plasma gas are allowed to arrive at work pieces 29a and 29b and are deposited thereon.
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