发明名称 POLISHING METHOD AND POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To timely and spacedly make a polishing speed uniform and to polish a free curved surface, etc., with a high accuracy by imparting a revolution motion while maintaining a directivity of a tool surface of a tool having a small diameter. SOLUTION: When a main shaft 1 is rotated, a center 13 of abrasive pad 3 is moved on a circular orbit 21 of a radius R around a revolution center 11, i.e., a rotation center of the main shaft 1. A tool surface is not rotated and a rotation position making a sub-shaft 2 as a center, i.e., a directivity is not varied. Namely, a locus of a processing point 5 caused by a revolution of abrasive pad 3 becomes a circular orbit 22. This is the same radius R as that of the circular orbit 21 of the center 13 of the abrasive pad 3 and a locus length of the processing point 5 and the center 13 is equal each other. Thus, the abrasive pad 3 is moved at the inside of a circle of a radius (R+r) making a revolution center 11 as a center, i.e., a center axis of the main shaft 1 when a radius of the tool is defined as (r). If a revolution speed during polishing step is constant, a polishing speed is timely and spacedly made uniform.
申请公布号 JP2001038592(A) 申请公布日期 2001.02.13
申请号 JP19990216118 申请日期 1999.07.30
申请人 CANON INC 发明人 FURUKAWA KANAME;ANDO MANABU
分类号 B24B13/00;(IPC1-7):B24B13/00 主分类号 B24B13/00
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