| 摘要 |
PROBLEM TO BE SOLVED: To provide a composite treating device which continuously subjects a film-like long-sized substrate to deposition of a-Si and p-Si chemical conversion treatment of a-Si. SOLUTION: This device has a transporting means for transporting the film- like long-sized substrate 10 in one direction, a deposition device 20 which has a differential exhaust device 21 in the inlet and outlet of the long-sized substrate and executes deposition on the long-sized substrate and a laser treating device which subjects the long-sized substrate arranged at the downstream side of the deposition device, emerging from the deposition device to a reforming treatment by irradiating the substrate with a laser beam.
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