发明名称 |
Plasma activated cvd method and device for producing a microcristalline si:h layer |
摘要 |
There are now provided thin-film solar cells and method of making. The devices comprise a low-cost, low thermal stability substrate with a semiconductor body deposited thereon by a deposition gas. The deposited body is treated with a conversion gas to provide a microcrystalline silicon body. The deposition gas and the conversion gas are subjected to a pulsed electromagnetic radiation to effectuate deposition and conversion. |
申请公布号 |
AU6697400(A) |
申请公布日期 |
2001.02.13 |
申请号 |
AU20000066974 |
申请日期 |
2000.07.25 |
申请人 |
MANFRED LOHMEYER |
发明人 |
BURKHARD DANIELZIK;WOLFGANG MOHL;NINA FREITAG |
分类号 |
C23C16/24;C23C16/515;C23C16/56;H01L21/205;H01L31/04;H01L31/18;H01L31/20 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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