| 摘要 |
A scanning type exposure apparatus comprises a mask stage position-measuring unit, a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, Wtheta) by the substrate position-measuring unit by a conversion vector comprising components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, Rtheta*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, Rtheta) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
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