发明名称 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
摘要 |
An apparatus for converting PFC gases exhausted from semiconductor processing equipment to less harmful, non-PFC gases. One embodiment of the apparatus includes a silicon filter and a plasma generation system. The plasma generation system forms a plasma from the effluent PFC gases. Constituents from the plasma react with silicon and/or oxygen in the filter and convert the effluent PFC gases to less harmful, non-PFC gaseous products and byproducts. Another embodiment includes a plasma generation system and a particle trapping and collection system. The particle trapping and collection system traps silicon containing residue from deposition processes that produces such residue, and the plasma generation system forms a plasma from the effluent PFC gases. Constituents from the plasma react with the collected residue to convert the effluent PFC gases to less harmful, non-PFC gaseous products and byproducts.
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申请公布号 |
US6187072(B1) |
申请公布日期 |
2001.02.13 |
申请号 |
US19960741272 |
申请日期 |
1996.10.30 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHEUNG DAVID;RAOUX SEBASTIEN;HUANG JUDY H.;TAYLOR, JR. WILLIAM N.;FODOR MARK;FAIRBAIRN KEVIN |
分类号 |
B01D45/06;B01D53/32;B01D53/46;B01J19/08;B01J19/12;B01J19/24;C23C16/44;H01J37/32;H01L21/205;H01L21/31;H05H1/24;(IPC1-7):B01D46/24 |
主分类号 |
B01D45/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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