发明名称 SPECIAL COATING AND COVERING MASK PELLICLE FRAME
摘要 <p>PROBLEM TO BE SOLVED: To prevent the generation of the voids caused by non-treatment and the generation of the trouble caused by the adhesion of dust and reflection in a metal part of a different kind by constituting a special coating and covering mask pellicle frame of a mask pellicle material and a special coating and covering layer. SOLUTION: Shot blast treatment is applied to the inner surface of a mask pellicle frame 1 and a chemical-resistant special coating and covering layer 2 is applied to the entire treated surface of the mask pellicle frame 1 and subsequently heat-treated. The voids caused by non-treatment are not generated in a metal part of a different kind and, since the entire surface of the mask pellicle frame 1 is coated with a flaw-free chemical-resistant special coating and covering layer 2, the generation of the trouble caused by the adhesion of dust and reflection can be suppressed and stable photographic printing can be obtained.</p>
申请公布号 JP2001038287(A) 申请公布日期 2001.02.13
申请号 JP19990247852 申请日期 1999.07.28
申请人 ARUMOURUDO:KK 发明人 KISHINO SHOJI
分类号 B05D5/00;B05D7/14;G03F1/64;(IPC1-7):B05D5/00 主分类号 B05D5/00
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