发明名称 Irradiation mask
摘要 A laser ablation mask, a method of mask production, and an process of workpiece irradiation are provided. In accordance with one embodiment of the present invention, a method of producing a radiation reflective mask is provided comprising the steps of: (i) providing a substrate, wherein the substrate is transparent to radiation of a selected range of wavelengths; (ii) forming a metallic layer over an upper surface of the substrate, wherein the metallic layer is reflective of the selected wavelengths of radiation; (iii) forming at least one pair of dielectric layers over an upper surface of the metallic layer, wherein the pair of dielectric layers are arranged to reflect incident radiation at the selected wavelengths; and (iv) patterning the metallic layer and the pair of dielectric layers to form apertures therein, wherein the apertures render portions of the mask transparent to the selected wavelengths of radiation.
申请公布号 US6187484(B1) 申请公布日期 2001.02.13
申请号 US19990387132 申请日期 1999.08.31
申请人 MICRON TECHNOLOGY, INC. 发明人 GLASS THOMAS R.;SCHOFIELD KEVIN H.
分类号 B23K26/06;G03F1/08;G03F1/14;(IPC1-7):G03F9/00 主分类号 B23K26/06
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