MANUFACTURE OF COLOR FILTER AND EXPOSING METHOD USED THEREFOR

摘要

PROBLEM TO BE SOLVED: To make performable the aligning work of an alignment mark without any trouble even if the alignment mark is formed by use of one color resist by setting a color filter for cutting a specified wavelength range on a light source. SOLUTION: The centers of the alignment markers 4b, 4c of second-color (green) and third-color (blue) pattern photomask 5b are mutually aligned by use of an alignment marker 4a' patterned on a substrate 1 by the alignment marker 4a of a first-color red pattern photomask 5a. In the exposure of the blue pattern, a color filter (visually, green) for cutting a long wavelength-side wavelength range is set between the light source of an aligner and a target (the photomask 5b and the substrate 1). The red alignment marker 4a' is seen through the color filter, the part overlapping the pattern is extremely dark so that the discrimination from the non-overlapping part is facilitated.