| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a correction method for the characteristics of a halftone phase shift mask which is capable of correcting the transmittance and phase difference characteristic of the halftone phase shift mask to the desired transmittance and phase difference. SOLUTION: A measuring instrument 18 measures the transmittance of the manufactured halftone phase shift mask 10 and outputs the transmittance to a controller 20. The controller 20 sets the halftone phase shift mask 10 at a holder 22 and drives a drive assembly 24 to immerse the mask for a prescribed time into a quartz vessel 28 packed with a solution 26 heated to a prescribed temperature by a heater 30. As a result, the characteristics, such as film thickness and composition, of the halftone film are changed, by which the transmittance is changed and is corrected to the desired transmittance. After the halftone phase shift mask 10 is immersed for the prescribed time, the mask is rinsed with hot pure water and pure water and is then subjected to 1PA drying.</p> |
