| 摘要 |
PROBLEM TO BE SOLVED: To form a pattern of a good shape by using a positive type photoresist composition containing an alkali-soluble resin and a specified photosensitive component. SOLUTION: The positive type photoresist composition contains an alkali- soluble resin and a photosensitive component containing the esterified product of a compound of the formula and a 1,2-naphthoquinonediazidosulfonyl compound. The alkali-soluble resin is not particularly limited and may be arbitrarily selected from resins each generally usable as a film forming material in a positive type photoresist composition. A condensation reaction product of an aromatic hydroxy compound and aldehydes or ketones, polyhydroxystyrene or its derivative is preferably used as the alkali-soluble resin. The aromatic hydroxy compound is, such as phenol, m-cresol, p-cresol or o-cresol, 2,3-xylenol, 2,5-xylenol. |
