| 摘要 |
<p>PROBLEM TO BE SOLVED: To extract and analyze information of the characteristics of an optical system by performing exposing and transferring operations in a short time, by projecting the image of a reticle having a periodic pattern into a space, detecting images at different positions including the depth of focus, and then deciding the projection characteristic of the optical system by analyzing the images. SOLUTION: A light source 12 of a photolithography system 10 projects the image of a reticle or a reticle 16 in a space or volume 14 of an object upon a photosensitive substrate or a photosensitive substrate 22 in an image space 20 through an optical system or a projection lens system 18. The reticle 16 or a wafer 22 is arranged, in such a way that the reticle 16 or wafer 22 is extended through the space of the object or depth of focus of the optical system or a projection lens system 18. From the image data recorded on the photosensitive substrate 22, the information indicating the characteristics of the optical system lens system 18 is obtained. Consequently, the image quality of the overall image field, which is obtained through focusing, can be obtained by one time projecting or exposing operation in a relatively short time.</p> |
