UNEVENNESS MEASURING DEVICE AND UNEVENNESS MEASURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an unevenness measuring device and an unevenness measuring method capable of easily discovering an unevenness and capable of quantitatively judging a correction. SOLUTION: Laser beams are radiated from a pair of laser oscillators 4, 6 provided at a prescribed interval to a separately located wall face 1 from different directions. When the measurement surface 1a of the wall face 1 exists at the reference distance L2, the unevenness of the wall face 1 is measured by superimposing projected images radiated by the laser beams in this unevenness measuring method. The said projected images radiated on the wall face 1 from the laser oscillators 4, 6 are linearly spread in the vertical direction.