| 摘要 |
PROBLEM TO BE SOLVED: To enhance positional accuracy of pattern exposure by accurately correcting a beam drift, while preventing reduction in the throughput. SOLUTION: A fluorescence 211, issued from an fluorescent substance film on a substrate 202 irradiated with an electron beam 203 based on one-irradiation position design data, is reflected by a inflecting mirror 212, guided to an imaging optical system 213, and then imaged on an image pick-up element 214. On the basis of an image signal S output from the element 214, a beam position computing means 215 finds an actually measured value De of the irradiation position of the electron beam 203, and finds a shift of the actually measured value De from a single irradiation position design data as a beam drift amountΔD. A deflection position computing means 208 corrects for the beam drift amountΔD, to compute a deflected position data Dd of the beam 203 corresponding to the next irradiation position design data.
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