POSITIVE TYPE ACTIVE ENERGY BEAM-SENSITIVE DRY FILM AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a positive type active energy beam-sensitive dry film excellent in photosensitivity. SOLUTION: The positive type active energy beam-sensitive dry film has a solid positive type active energy beam-sensitive urethane resin layer formed on the surface of an active energy beam-insensitive substrate by applying a resin composition containing (A) at least one unsaturated urethane compound selected from a vinyl ether urethane compound, a vinyl ester urethane compound and a propenyl ester urethane compound, (B) a carboxyl and/or hydroxyphenyl- containing resin or mixture and (C) a photo-acid generating agent as essential components and subsequently carrying out crosslinking by heating.