发明名称 SOLUTION PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a solution processing apparatus capable of improving the recovery efficiency of processing solution mist by minimizing exhaust loss when a processing solution is driven out of a substrate. SOLUTION: To entrap and downwardly guide a rinsing solution supplied to a substrate in a manner covering the substrate when the rinsing solution is squeezed out by spinning using a spin chuck, a cup 47 is arranged in a vertically movable fashion. A drain tube 50b for draining out the rinsing solution and an exhaust tube for exhausting rinsing solution mist are provided on the bottom of a container 48 which is provided so as to cover the outer circumferential surface of the cup 47. An annular dam member 57 is provided in a manner projecting upward from the upper opening of the tube 50b, so that the member 57 allows the rinsing solution squeezed out by spinning using the spin chuck to be stored in the container 48, thereby sealing the cup 47 for separation from the container 48.
申请公布号 JP2001035828(A) 申请公布日期 2001.02.09
申请号 JP19990207334 申请日期 1999.07.22
申请人 TOKYO ELECTRON LTD 发明人 SAKAI MITSUHIRO;SADA TETSUYA
分类号 H01L21/027;G03F7/30;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/027
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