| 摘要 |
<p>A monitoring system (100) may include a first chemical vessel (102) containing a first chemical mixture and a second chemical vessel (104) containing a second chemical mixture. The monitoring system (100) may further include a sensor (106) configured to selectively receive a first sample flow of the first chemical mixture from the first chemical vessel (102) and a second sample flow of the second chemical mixture from the second chemical vessel (104). The sensor (106) may be configured to measure a first sample attribute value of the first sample flow and a second sample attribute value of the second sample flow. The system may be further configured to control an attribute of the chemical mixtures being monitored. By multiplexing multiple sample flows through a sensor (106), the monitoring system (100) may monitor and/or control attributes of multiple chemical mixtures without requiring separate sensors for each chemical mixture monitored by the system.</p> |
