| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma radical generator capable of generating radicals under discharged plasma condition at high efficiency. SOLUTION: This device has a discharge vessel 31 for generating radicals with high frequency discharge. The discharge vessel 31 consists of a cathode portion 6 located near an entrance for material gas into which high frequency power is supplied, a jet portion 5 located next to the cathode portion 6 and having a smaller sectional area than that of the cathode portion 6, and an anode portion 7 located next to the jet portion 5 and having a larger sectional area than that of the jet portion 5. |
