发明名称 |
Method for generating an elementary plasma in order to produce a uniform plasma for a target surface and device for generating such a plasma |
摘要 |
A tank (1) contains a working surface (Su) and has means to maintain a gas under reduced pressure. Sources of microwave energy (E) located outside the tank and distributed over the working surface send energy along a tube (4) which has a coaxial shielding tube (4') to prevent mutual interference. Magnetic dipoles (5) at the end of the tubes produce electronic oscillation and a uniform plasma adjacent to the working surface (Su) |
申请公布号 |
EP1075168(A1) |
申请公布日期 |
2001.02.07 |
申请号 |
EP20000420172 |
申请日期 |
2000.08.02 |
申请人 |
METAL PROCESS |
发明人 |
LAGARDE, THIERRY;PELLETIER, JACQUES |
分类号 |
H01L21/205;H01L21/302;H01L21/3065;H05H1/46 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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