发明名称 Method for generating an elementary plasma in order to produce a uniform plasma for a target surface and device for generating such a plasma
摘要 A tank (1) contains a working surface (Su) and has means to maintain a gas under reduced pressure. Sources of microwave energy (E) located outside the tank and distributed over the working surface send energy along a tube (4) which has a coaxial shielding tube (4') to prevent mutual interference. Magnetic dipoles (5) at the end of the tubes produce electronic oscillation and a uniform plasma adjacent to the working surface (Su)
申请公布号 EP1075168(A1) 申请公布日期 2001.02.07
申请号 EP20000420172 申请日期 2000.08.02
申请人 METAL PROCESS 发明人 LAGARDE, THIERRY;PELLETIER, JACQUES
分类号 H01L21/205;H01L21/302;H01L21/3065;H05H1/46 主分类号 H01L21/205
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