发明名称 Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulator
摘要 A semiconductor device manufacturing method capable of proceeding semiconductor device manufacturing processes according to predetermined schedules or while correcting them without testpieces is provided. The method includes the steps of collecting actually observed data during at least one of plural steps, obtaining prediction data in at least one of plural steps by using an ab initio molecular dynamics process simulator or a molecular dynamics simulator, comparing and verifying the prediction data and the actually observed data sequentially at real time, and correcting and processing the plural manufacturing process factors sequentially at real time if a difference in significance is recognized between set values for the plural manufacturing process factors and the plural manufacturing process factors estimated from the actually observed data according to comparison and verification.
申请公布号 US6185472(B1) 申请公布日期 2001.02.06
申请号 US19960777189 申请日期 1996.12.27
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ONGA SHINJI;OKADA TAKAKO;TOMITA HIROSHI;YAMABE KIKUO;OKANO HARUO
分类号 G06F17/50;H01L21/66;(IPC1-7):G06F19/00 主分类号 G06F17/50
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