| 摘要 |
A method and apparatus to fabricate nano-device and semiconductor device structures and features by controlling a coherent or near coherent particle beam to directly deposit, or direct write, onto a preselected deposition site of a substrate and into a predetermined shape is provided. Evanescent wave plates are optionally included to increase the order of the particle beam prior to interaction with a photonic lens. The photonic lens is holographically generated by means of a source laser and an optical lens to focus the atomic beam onto the deposition site by means of Lorenz force interaction between light fields of the photonic lens and dipole moments of the atoms of the atomic beam. The diffraction pattern of the optical lens is computer calculated to precisely form the desired photonic lens in accordance with the shape and size of the desired feature or structure to be built on the substrate and the characteristics of the atomic beam, the source laser, the shape and position of the substrate and the location of the deposition site.
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