发明名称 Method of staining a semiconductor wafer with a semiconductor treatment chemical
摘要 A method for staining a portion of a semiconductor wafer sample with a semiconductor treatment chemical. On embodiment of the method includes gripping the semiconductor wafer sample in a first openly biasable slot in a flexible bar and suspending the semiconductor wafer into the chemical. Other embodiments of the method may further include gripping plural semiconductor wafer samples in openly biasable sots in flexible bars to enable a plurality of semiconductor wafer samples to be treated with a semiconductor treatment chemical.
申请公布号 US6183813(B1) 申请公布日期 2001.02.06
申请号 US19990286235 申请日期 1999.04.05
申请人 MICRON TECHNOLOGY, INC. 发明人 MARTINI FRANK E.
分类号 H01L21/00;H01L21/673;(IPC1-7):B05D1/18 主分类号 H01L21/00
代理机构 代理人
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