发明名称 MANUFACTURE OF HIGHLY WATER ABSORPTIVE RESIN
摘要 PROBLEM TO BE SOLVED: To increase the average particle size and improve resin fixation by supplying little by little a monomer aq. soln. contg. a phosphate ester dispersant to a hydrophobic org. solvent contg. a nonionic dispersant, and kept under a polymn. condition. SOLUTION: As a monomer, usually a monovinyl monomer selected from the group consisting of (meth)acrylic acid, its salt, or (meth)acryl amide, or one consisting mainly thereof. This monomer soln. contains a phosphoric acid dispersant represented by the formula I, wherein R1 is a 8-30C alkyl group may be replaced with a phenyl group, or an aryl group may be replaced with an alkyl group, R2 is a hydroxyl group or a group represented by the formula II, and n is an integer of 1-30. During the suspension polymn., wherein the monomer aq. soln. is continuously supplied to a hydrophobic org. soln. kept under a refluxing condition, and it is pref. that the monomer soln. is supplied in not less than 20% of the time required for the total polymn.
申请公布号 JP2001031704(A) 申请公布日期 2001.02.06
申请号 JP19990204352 申请日期 1999.07.19
申请人 MITSUBISHI CHEMICALS CORP 发明人 SUGIYOU YASUNARI;ITO KIICHI
分类号 C08F2/18;C08F2/44;(IPC1-7):C08F2/18 主分类号 C08F2/18
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