发明名称 Production of a texture layer made of an oxide material on a substrate comprises partially fading out sputter ions that are scattered back from the sputtering target so that the larger part
摘要 Production of a texture layer made of an oxide material on a substrate (9) comprises sputtering a target. During coating, a stream of gas ions are directed onto the substrate at a predetermined angle. Sputter ions (11) that are scattered back from the sputtering target (7) are partially faded out so that the larger part of the back-scattered ions hit the edge region of the surface of the substrate.
申请公布号 DE19932444(C1) 申请公布日期 2001.02.01
申请号 DE19991032444 申请日期 1999.07.12
申请人 SIEMENS AG 发明人 NIES, RAINER;UTZ, BERND;KINDER, HELMUT
分类号 C23C14/22;C23C14/46;H01L39/24;(IPC1-7):C23C14/34;C04B35/45;C23C14/08 主分类号 C23C14/22
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