Extreme UV and soft X-ray radiation source e.g. for extreme UV lithography, has auxiliary electrode behind opening in one main gas discharge electrode for increasing energy conversion efficiency

摘要

The radiation source uses gas discharge within a gas-filled space (7) between 2 main electrodes (1,2), each provided with an opening (3,8) lying along a symmetry axis (5) for the plasma channel source, the energy conversion efficiency of the radiation source increased via an auxiliary electrode (9a) behind the opening in one of the main electrodes.