摘要 |
A silicon nitride film (2) is provided on a silicon substrate (1), and on the film (2) is laminated a semiconductor laminate (11) having at least n-type layers (3), (4) and p-type layers (6), (7) consisting of ZnO compound semiconductors so as to form a luminous layer. This silicon nitride film (2) is preferably formed by heat-treatment in an atmosphere containing nitrogen such as ammonia gas. In another embodiment, a luminous element or the like is formed by growing a ZnO compound semiconductor layer with a plane orthogonal to the C plane of a sapphire substrate used as a main plane, thereby providing a high-characteristic element using a ZnO compound such as an LED excellent in crystallinity and high in luminous efficiency. |
申请人 |
JAPAN AS REPRESENTED BY SECRETARY OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY;ROHM CO., LTD.;NIKI, SHIGERU;FONS, PAUL;IWATA, KAKUYA;TANABE, TETSUHIRO;TAKASU, HIDEMI;NAKAHARA, KEN |
发明人 |
NIKI, SHIGERU;FONS, PAUL;IWATA, KAKUYA;TANABE, TETSUHIRO;TAKASU, HIDEMI;NAKAHARA, KEN |