发明名称 |
A COMPACT PHOTOEMISSION SOURCE, FIELD AND OBJECTIVE LENS ARRANGEMENT FOR HIGH THROUGHPUT ELECTRON BEAM LITHOGRAPHY |
摘要 |
An improved compact tandem photon and electron beam lithography system includes a field lens adjacent the photoemission source which is utilized in combination with an objective lens to minimize field aberrations in the usable emission pattern and minimize the interaction between electrons to improve the throughput of the system. If desired, a demagnifying lens can be utilized between the field lens and the objective lens to increase the demagnification ratio of the system. |
申请公布号 |
WO0055690(A3) |
申请公布日期 |
2001.02.01 |
申请号 |
WO2000US07060 |
申请日期 |
2000.03.15 |
申请人 |
ETEC SYSTEMS, INC. |
发明人 |
MANKOS, MARIAN;VENEKLASEN, LEE, H. |
分类号 |
G03F7/20;H01J37/073;H01J37/12;H01J37/145;H01J37/305;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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