发明名称 Verfahren und Vorrichtung zum Transportieren eines Halbleiterwafers durch einen Behandlungsbehälter
摘要 The aim of the invention is to provide a simple and inexpensive means for guaranteeing a homogeneous and good treatment of substrates. To this end, the invention provides a device and a method for transporting a substrate through a treatment container that has a width in the direction of transport of the substrate that is smaller than the diameter of the substrate. The substrate is partially transported through the treatment container by means of a first transport element that is mounted in the direction of transport of the substrate. It is then picked up by a second transport element that is located behind the treatment container in the direction of transport of the substrate and is pulled through the container.
申请公布号 DE19934301(A1) 申请公布日期 2001.02.01
申请号 DE19991034301 申请日期 1999.07.21
申请人 STEAG MICROTECH GMBH 发明人 SPEH, ULRICH;SCHNEIDER, JENS
分类号 B65G49/07;H01L21/677;(IPC1-7):B65G49/07;B65G49/02 主分类号 B65G49/07
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