发明名称 |
Verfahren und Vorrichtung zum Transportieren eines Halbleiterwafers durch einen Behandlungsbehälter |
摘要 |
The aim of the invention is to provide a simple and inexpensive means for guaranteeing a homogeneous and good treatment of substrates. To this end, the invention provides a device and a method for transporting a substrate through a treatment container that has a width in the direction of transport of the substrate that is smaller than the diameter of the substrate. The substrate is partially transported through the treatment container by means of a first transport element that is mounted in the direction of transport of the substrate. It is then picked up by a second transport element that is located behind the treatment container in the direction of transport of the substrate and is pulled through the container.
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申请公布号 |
DE19934301(A1) |
申请公布日期 |
2001.02.01 |
申请号 |
DE19991034301 |
申请日期 |
1999.07.21 |
申请人 |
STEAG MICROTECH GMBH |
发明人 |
SPEH, ULRICH;SCHNEIDER, JENS |
分类号 |
B65G49/07;H01L21/677;(IPC1-7):B65G49/07;B65G49/02 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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